Talos TEM

TEM

Description

The FEI Talos™ f200i S/TEM is a 200 kV field emission (scanning) transmission electron microscope that has been designed for fast, precise and quantitative characterization of nanomaterials; achieving atomic resolution. With column alignments at 120 kV and 200 kV the Talos™ f200i S/TEM is capable of imaging a broad range of materials science and biological samples.

The S/TEM column is fully automated, equipped with a S-FEG, isolated vacuum system for the electron gun, symmetric X-TWIN objective lens, computerized 5 axes eucentric goniometer, diffraction lens, intermediate lens, two projector lenses, fast survey camera, and a vibration-free vacuum system.

Techniques include: brightfield (BF), darkfield (DF), high resolution-TEM (HR-TEM for crystalline samples), diffraction, selected area electron diffraction (SAED), nanobeam diffraction, convergent beam electron diffraction (CBED), scanning transmission electron microscopy (STEM), high resolution-STEM (HR-STEM), and Energy Dispersive X-Ray Spectroscopy (EDS).

Capabilities

  • Accelerating voltage: 120 kV and 200 kV (possible to do 80 kV) 
  • Magnification Range: 25X – 1.05MX​ 
  • TEM line resolution: ≤0.12nm​ 
  • STEM resolution: ≤0.16nm​ 
  • HAADF STEM detector​ 
  • Maximum full convergence angle for LACBED: ≥ 100mrad​ 
  • Maximum diffraction angle: 24° ​ 
  • Z-movement total travel (standard holders): ±0.375mm​ 
  • Maximum tilt with double tilt holder: α ± 30°, β ± 30°​ 
  • Specimen drift (standard holders): ≤ 0.5nm/min ​ 
  • 4k x 4k CETA 16M CMOS Camera​ 
  • Sample holders
    • Single tilt holder
    • Double tilt holder
    • Low background double tilt HIVis holder
  • Maximum tilt with double tilt holder: α ± 35°, β± 30°
  • Maximum Diffraction angle: 24°
  • 30 mm2 retractable Bruker X-flash™ 6|30 EDS detector 
  • Velox™ advanced acquisition and processing software

Location: Supple 171
Manager: Dr. Casey Smith, casey.smith@txstate.edu
Trainer: Chironjib Chandan, chironjib.chandan@txstate.edu
Model: FEI TALOS f200i
Funded by: The Materials Applications Research Center (MARC)

Cu

Copper at 11000x