Rapid Thermal Annealer (RTA/RTP)

RTP

Description

Our AGA Heatpulse 610 is a benchtop rapid thermal annealer (RTA/RTP) that utilizes high power lamps to heat treat thin films and substrates for processes such as contact formation, silicide formation, and dopant diffusion/activation.  Temperature control via PID loop has a maximum heating rate of ~50 C/s and maximum temperature of 1000 C.  The chamber can also be atmospheric purged with N2, Ar, 4% H2balAr, or O2.

Capabilities

  • Max sample diameter 150mm
  • Sensarray wafer to measure heating uniformity across topside of the sample
  • Manifold for simple gas delivery

Location: RFM 1246
Manager: Melvin Cruz, melvincruz@txstate.edu
Backup: Dr. Casey Smith, casey.smith@txstate.edu, 512-213-7909
Model: AGA Heatpulse 610