Rapid Thermal Annealer (RTA/RTP)
Description
Our AGA Heatpulse 610 is a benchtop rapid thermal annealer (RTA/RTP) that utilizes high power lamps to heat treat thin films and substrates for processes such as contact formation, silicide formation, and dopant diffusion/activation. Temperature control via PID loop has a maximum heating rate of ~50 C/s and maximum temperature of 1000 C. The chamber can also be atmospheric purged with N2, Ar, 4% H2balAr, or O2.
Capabilities
- Max sample diameter 150mm
- Sensarray wafer to measure heating uniformity across topside of the sample
- Manifold for simple gas delivery
Location: RFM 1246
Manager: Melvin Cruz, melvincruz@txstate.edu
Backup: Dr. Casey Smith, casey.smith@txstate.edu, 512-213-7909
Model: AGA Heatpulse 610