PE-50 O2 Plasma Asher
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Description
Our PE-50 Plasma Asher utilizes a 100W 13.56MHz power supply with auto-matching network in a direct contact parallel plate configuration for uniform plasma generation. Samples up to 5" in diameter can be exposed to two different ionized gas species (O2, arranged by request) for high-rate etching of polymers, photo-resist, and other materials as well as for plasma cleaning and surface modification.
Location: RFM 1246
Manager: Melvin Cruz, melvincruz@txstate.edu
Backup: Dr. Casey Smith, casey.smith@txstate.edu, 512-213-7909
Model: Plasma Etch PE-50