Crystalline Oxides

Description

Growth of crystalline multifunctional oxides on oxide and semiconductor substrates as well as Si and Si/Ge heterostructures. Oxides include members of the perovskites family (SrTiO3, LaAlO3, BaTiO3), HfO and ZrO. Crystalline oxides on large-area silicon are used as virtual substrates for integrating other multifunctional oxides on semiconductors, allowing a common platform for integrating multiple semiconductors and devices on the same “chip.” Hf and Zr oxides are used in the development of future gate dielectric on Si CMOS to address the replacement of conventional SiO2. Electron- beam deposition of metals is studied to develop metal gates with suitable work functions for both p- and n-channel devices. Current sources include Mn, Fe, La, Ba, Si, Sr, Bi, Ti, and O2 plasma.