Teaching Bay Diffusion Furnace (MRL P-Type)

Description

The MRL Diffusion furnaces flow oxygen (O₂) and/or nitrogen (N₂) into an atmospheric pressure quartz tube furnace capable of achieving temperatures up to 1100 ^oC.  These conditions result in the volatilization of n-type or p-type dopant species from a ceramic or spin-on-glass source.  These dopants diffuse into the surface of up to twenty-five (25) 100mm diameter silicon (Si) wafers to modify the exposed silicon carrier type, density, and junction depth.

Capabilities

• Ceramic source or SOD boron sources allowed
• Maximum wafer diameter of 100mm