Oxidation Furnace-Wet/Dry

OWF

Description

This equipment flows oxygen and water vapor into a quartz tube furnace to grow thick thermal SiO2 on silicon wafers with a maximum diameter of 100mm.

Capabilities

  • Permits Silicon wafers up to 100mm in diameter and oxidation temperature < 1100C.

Location: RFM 1246
Manager: Melvin Cruz, melvincruz@txstate.edu
Backup: Dr. Casey Smith, casey.smith@txstate.edu, 512-213-7909
Model: MRL Wet Oxidation Furnace