HMDs Oven
Description
Our HMDS oven exposes samples to hexamethyl disilazane vapor in a heated vacuum environment to desorb water and chemically render the sample surface hydrophobic to ensure photoresist adhesion.
Our HMDS oven exposes samples to hexamethyl disilazane vapor in a heated vacuum environment to desorb water and chemically render the sample surface hydrophobic to ensure photoresist adhesion.